From Si on plastic to semiconductor wafer stacks
Every aspect of modern life benefits from coating or thin film technology. Whether a barrier layer film in an integrated circuit chip or a conversion coating on an aluminum beverage can, X-ray analytical techniques are integral to both R&D development, production process control and quality assurance. X-ray fluorescence (XRF) can determine the thickness and elemental composition of metallic coatings. Commonly employed in the semiconductor manufacturing process as a metrology tool, X-ray reflectometry (XRR) is used to measure layer thicknesses in a multi-layer stack of coatings and also can characterize other coating properties like roughness and interlayer diffusion. Emerging as a leading enabler for nano-technology research, X-ray diffraction (XRD) and associated techniques are employed to examine the nature of the molecular structure of films. Rigaku technology and experience provide a variety of non-destructive analytical solutions for coating and thin film measurements.
Benchtop tube below sequential WDXRF spectrometer analyzes O through U in solids, liquids and powders
New 6th-generation general purpose benchtop XRD system for phase i.d and phase quantification
Advanced state-of-the-art high-resolution XRD system powered by Guidance expert system software
High power, tube above, sequential WDXRF spectrometer with new ZSX Guidance expert system software
Low-cost EDXRF elemental analyzer measures Na to U in solids, liquids, powders and thin-films
New 60 kV EDXRF system featuring QuantEZ software and optional standardless analysis
New variable collimator small spot 60 kV EDXRF system featuring QuantEZ software.
EDXRF spectrometer with powerful Windows® software and optional FP.
High-performance, Cartesian-geometry EDXRF elemental analyzer measures Na to U in solids, liquids, powders and thin films
EDXRF multi-element process analyzer; analyze aluminum (Al) through uranium (U)
Scanning multi-element process coatings analyzers for web or coil applications