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Advanced and New Materials

Advanced and New Materials

Every aspect of modern life benefits from coating or thin film technology. Whether analyzing a barrier layer film in an integrated circuit chip or a conversion coating on an aluminum beverage can, X-ray analytical techniques are integral to R&D, production process control and quality assurance of such materials. Composition and structure of coatings, thin films, multilayers, materials, solar cells, batteries, semiconductors, nanomaterials and many other materials can be analyzed by X-ray fluorescence (XRF) to determine the thickness and elemental composition in metrology. XRT (X-ray topography) can be employed to investigate crystalline defects and X-ray Reflectometry (XRR) to measure layer thicknesses, roughness and interlayer diffusion. Emerging as a leading enabler for such thin film and nanotechnology research, X-ray diffraction (XRD) and associated diffuse scattering methods like SAXS examine the nature of the molecular structure of films, coatings and layers or particles in biology, chemistry, physics, and engineering. Rigaku’s advanced technology and experience provide a variety of non-destructive and state-of-the-art analytical solutions and service.

Rigaku recommends the following systems:


WDXRF

Benchtop tube below sequential WDXRF spectrometer analyzes O through U in solids, liquids and powders

High power, tube below, sequential WDXRF spectrometer with Smart Sample Loading System (SSLS)

High power, tube above, sequential WDXRF spectrometer with new ZSX Guidance expert system software

High power, tube above, sequential WDXRF spectrometer

WDXRF spectrometer designed to handle very large and/or heavy samples

High-throughput tube-above multi-channel simultaneous WDXRF spectrometer analyzes Be through U

High-power, tube-below, sequential WDXRF spectrometer with new ZSX Guidance expert system software

Single crystal

Our most popular diffractometer for single crystal analysis, configured with either single or dual microfocus sealed tube X-ray sources and an extremely low noise direct X-ray detection detector.

A benchtop single crystal X-ray diffractometer ideal for chemical crystallography and teaching.

A modern single crystal X-ray diffractometer for structural analysis configured with microfocus sealed tube technology and a direct X-ray detection detector.

Our most popular diffractometer for measuring difficult samples, configured with a high-flux rotating anode X-ray source and an extremely low noise direct X-ray detection detector.

A dual-wavelength, high-flux, rotating anode X-ray diffractometer specifically configured for measuring difficult samples as well as providing versatility through multiple wavelengths.

A bespoke, extremely high-flux diffractometer with custom enclosure and the flexibility to utilize both ports of the rotating anode X-ray source.

XRD

New 6th-generation general purpose benchtop XRD system for phase i.d and phase quantification

Advanced state-of-the-art high-resolution XRD system powered by Guidance expert system software

Highly versatile multipurpose X-ray diffractometer with built-in intelligent guidance

High-performance, multi-purpose XRD system for applications ranging from R&D to quality control

Stress

Laboratory micro-spot XRD residual stress analysis with both iso- and side-inclination methods

EDXRF

Low-cost EDXRF elemental analyzer measures Na to U in solids, liquids, powders and thin-films

Performance EDXRF elemental analyzer measures Na to U in solids, liquids, powders and thin-films

New 60 kV EDXRF system featuring QuantEZ software and optional standardless analysis

New variable collimator small spot 60 kV EDXRF system featuring QuantEZ software.

EDXRF spectrometer with powerful Windows® software and optional FP.

High-performance, Cartesian-geometry EDXRF elemental analyzer measures Na to U in solids, liquids, powders and thin films

SAXS

Small angle X-ray scattering (SAXS) Kratky camera system.

Small and wide angle X-ray scattering instrument designed for nano-structure analyses

Small and wide angle X-ray scattering instrument designed for nano-structure analyses

A modernized 2D Kratky system that eliminates data corrections required of traditional systems

X-ray CT

High-speed, stationary sample microtomography of large samples

Ultra-high resolution nanotomography using parallel beam geometry

High-resolution benchtop microtomography of large samples

X-ray topography (XRT)

A fast, high-resolution laboratory X-ray topography system for non-destructive dislocation imaging

Semiconductors

In-line, simultaneous WDXRF spectrometer for wafer metal film metrology; up to 300 mm wafers

Simultaneous WDXRF spectrometer for wafer metal film metrology; up to 200 mm wafers

Sequential WDXRF spectrometer for elemental analysis and thin-film metrology of large and/or heavy samples

Process XRR, XRF, and XRD metrology tool for blanket and patterned wafers; up to 300 mm wafers

Trace elemental surface contamination metrology by TXRF; up to 200 mm wafers.

Trace elemental surface contamination metrology by TXRF; up to 200 mm wafers.

Trace elemental surface contamination metrology by TXRF; up to 300 mm wafers

Ultra-trace elemental surface contamination metrology by TXRF with VPD capability; up to 300 mm wafers

XRF and optical metrology tool for blanket and patterned wafers; up to 300 mm wafers

This versatile X-ray metrology tool enables high-throughput measurements on blanket wafers ranging from ultra-thin single-layer films to multilayer stacks for process development and film quality control.